Quartz

Nd:YLF features an extremely large fluorescence line width, low thermal lensing effect and natural polarization. It is widely used in mode-locked lasers, continuous lasers and material processing fields. As an alternative medium to Nd:YAG, Nd:YLF is used to work in the near-infrared region, generating lasers at wavelengths of 1047nm and 1053nm. It can be applied in linearly polarized resonators, mode-locked lasers, diode-pumped Nd:YLF lasers and Ti:sapphire chirped pulse amplifiers.

Base on phase-shifting technique, the laser interferometer, widely used in the high-precision measurement of planar and spherical optical components, characterizes the three-dimensional topography of the measured surface with a precision of 0.06 μm (Peak-to-valley) or higher.

Cerium doped Lutetium Aluminium Garnet (Ce:LuAG) is a well-established scintillator and has many attractive properties, such as fast decay (80ns),high light yield, emission peaks at 510nm that well matched with the sensitivity of commercial Si-CCD detectors as well as good mechanical and chemical stability. Ce:LuAG is also a very appropriate crystal for imaging screens, LED lighting and laser lighting.

Ultraviolet galvanometer scanner‘s substrate is silicon/K9/quartz. It's mainly applied to the laser scanning devices of laser marking and 3D printing etc.

Lens'es substrate is K9/BK7/quartz.

It provide different polishing and grinding plats with different specs, which could be used in the polishing and grinding of different kinds of optical glasses, quartz, crystals and other fragile flat and sphere surface.

Grown by Czochralski method
Diameter: up to 485mm
Dopant B (Borum)
Type of conductivity: P
Orientation: 100
Resistivity: up to 10000
Notch-yes Notch Location: 110
Notch size: 2,3 mm
shape of the Notch: V
Wafer thickness: 775±25 microns Type of marking: laser Marking location Reverse side Edge Profile: SEMI T/4 S1/S2 polishing- yes
Total thickness change across the wafers (TTV), microns < 3
WARP: <40 microns The number of particles on a surface larger
than 0.12 microns: <40
Surface content of Aluminum, E10AT/CM2: 5